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Proceedings Paper

Improved resolution for soft-x-ray monochromatization using lamellar multilayer gratings
Author(s): R. van der Meer; B. Krishnan; I. V. Kozhevnikov; M. J. De Boer; B. Vratzov; H. M. J. Bastiaens; J. Huskens; W. G. van der Wiel; P. E. Hegeman; G. C. S. Brons; K.-J. Boller; F. Bijkerk
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Paper Abstract

Lamellar Multilayer Gratings (LMG) offer improved resolution for soft-x-ray (SXR) monochromatization, while maintaining a high reflection efficiency in comparison to conventional multilayer mirrors (MM). We previously used a Coupled-Waves Approach (CWA) to calculate SXR diffraction by LMGs and identified a single-order regime in which the incident wave only excites a single diffraction order. We showed that in this regime the angular width of the zeroth-order diffraction peak simply scales linearly with Γ (lamel-to-period ratio) without loss of peak reflectivity. However, the number of bi-layers must then be increased by a factor of 1/Γ. Optimal LMG resolution and reflectivity is obtained in this single-order regime, requiring grating periods of only a few hundred nm, lamel widths < 100nm and lamel heights > 1μm [1]. For the fabrication of LMGs with these dimensions, we use a novel process based on UV-NanoImprint Lithography (UV-NIL) and Bosch-type Deep Reactive Ion Etching (DRIE). Successful fabrication of LMGs with periods down to 200nm, line widths of 60nm and multilayer stack heights of 1μm is demonstrated. SXR reflectivity measurements were performed on these LMGs at the PTB beamline at the BESSYII synchrotron facility. The measurements demonstrate an improvement in resolution by a factor 3,5 compared to conventional MMs. Further analysis of the SXR reflectivity measurements is currently being performed.

Paper Details

Date Published: 28 September 2011
PDF: 8 pages
Proc. SPIE 8139, Advances in X-Ray/EUV Optics and Components VI, 81390Q (28 September 2011); doi: 10.1117/12.892687
Show Author Affiliations
R. van der Meer, Univ. of Twente (Netherlands)
B. Krishnan, Univ. of Twente (Netherlands)
I. V. Kozhevnikov, A.V. Shubnikov Institute of Crystallography (Russian Federation)
M. J. De Boer, Univ. of Twente (Netherlands)
B. Vratzov, Univ Twente (Netherlands)
NT&D - Nantechnology and Devices (Germany)
H. M. J. Bastiaens, Univ. of Twente (Netherlands)
J. Huskens, Univ. of Twente (Netherlands)
W. G. van der Wiel, Univ. of Twente (Netherlands)
P. E. Hegeman, PANalytical (Netherlands)
G. C. S. Brons, PANalytical (Netherlands)
K.-J. Boller, Univ. of Twente (Netherlands)
F. Bijkerk, Univ. of Twente (Netherlands)
FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)


Published in SPIE Proceedings Vol. 8139:
Advances in X-Ray/EUV Optics and Components VI
Christian Morawe; Ali M. Khounsary; Shunji Goto, Editor(s)

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