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Proceedings Paper

The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers
Author(s): Y. P. Pershyn; E. M. Gullikson; I. A. Artyukov; V. V. Kondratenko; V. A. Sevryukova; D. L. Voronov; E. N. Zubarev; A. V. Vinogradov
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Paper Abstract

Impact of Ar gas pressure (1-4 mTorr) on the growth of amorphous interlayers in Mo/Si multilayers deposited by magnetron sputtering was investigated by small-angle x-ray scattering (λ=0.154 nm) and methods of cross-sectional transmission electron microscopy. Some reduction of thickness of the amorphous inter-layers with Ar pressure increase was found, while composition of the layers was enriched with molybdenum. The interface modification resulted in raise of EUV reflectance of the Mo/Si multilayers.

Paper Details

Date Published: 28 September 2011
PDF: 11 pages
Proc. SPIE 8139, Advances in X-Ray/EUV Optics and Components VI, 81390N (28 September 2011); doi: 10.1117/12.892324
Show Author Affiliations
Y. P. Pershyn, Kharkov Polytechnic Institute (Ukraine)
E. M. Gullikson, Lawrence Berkeley National Lab. (United States)
I. A. Artyukov, P.N. Lebedev Physical Institute (Russian Federation)
V. V. Kondratenko, Kharkov Polytechnic Institute (Ukraine)
V. A. Sevryukova, Kharkov Polytechnic Institute (Ukraine)
D. L. Voronov, Lawrence Berkeley National Lab. (United States)
E. N. Zubarev, Kharkov Polytechnic Institute (Ukraine)
A. V. Vinogradov, P.N. Lebedev Physical Institute (Russian Federation)


Published in SPIE Proceedings Vol. 8139:
Advances in X-Ray/EUV Optics and Components VI
Christian Morawe; Ali M. Khounsary; Shunji Goto, Editor(s)

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