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Proceedings Paper

Electron microscopy characterization of some carbon based nanostructures with application in divertors coatings from fusion reactor
Author(s): V. Ciupina; I. Morjan; C. P. Lungu; R. Vladoiu; G. Prodan; M. Prodan; V. Zarovschi; C. Porosnicu; I. M. Stanescu; M. Contulov; A. Mandes; V. Dinca; K. Sugiyama
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Paper Abstract

Nanostructured carbon materials have increasingly attracted the interest of the scientific community, because of their fascinating physical properties and potential applications in high-tech devices. In the current ITER design, the tiles made of carbon fiber composites (CFCs) are foreseen for the strike point zone and tungsten (W) for other parts of the divertor region. This choice is a compromise based mainly on experience with individual materials in many different tokamaks. Also Beryllium is the candidate material for the First Wall in ITER. In order to prepare nanostructured carbon-tungsten nanocomposite for the divertor part in fusion applications, the original method thermionic vacuum arc (TVA) was used in two electronic guns configuration. One of the main advantages of this technology is the bombardment of the growing thin film just by the ions of the depositing film. The nanostructured C-W and C-Be films were characterized by Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM) and Atomic Force Microscopy (AFM). The C-W films were identified as a nanocrystals complex (5 nm average diameter) surrounded by amorphous structures with a strong graphitization tendency, allowing the creating of adherent and wear resistant films. The C-Be films are polycrystalline with mean grain size about 15 nm. The friction coefficients (0.15 - 0.35) of the C-W coatings was decreased more than 3-5 times in comparison with the uncoated substrates proving excellent tribological properties. C-W nanocomposites coatings were designed to have excellent tribological properties while the structure is composed by nanocrystals complex surrounded by amorphous structures with a strong graphitization tendency, allowing the creating of adherent and wear resistant films.&updat

Paper Details

Date Published: 26 September 2011
PDF: 9 pages
Proc. SPIE 8104, Nanostructured Thin Films IV, 810411 (26 September 2011); doi: 10.1117/12.892198
Show Author Affiliations
V. Ciupina, Univ. Ovidius Constanta (Romania)
I. Morjan, National Institute for Lasers, Plasma and Radiation Physics (Romania)
C. P. Lungu, National Institute for Lasers, Plasma and Radiation Physics (Romania)
R. Vladoiu, Univ. Ovidius Constanta (Romania)
G. Prodan, Univ. Ovidius Constanta (Romania)
M. Prodan, Univ. Ovidius Constanta (Romania)
V. Zarovschi, National Institute for Lasers, Plasma and Radiation Physics (Romania)
C. Porosnicu, National Institute for Lasers, Plasma and Radiation Physics (Romania)
I. M. Stanescu, Univ. Ovidius Constanta (Romania)
M. Contulov, Univ. Ovidius Constanta (Romania)
A. Mandes, Univ. Ovidius Constanta (Romania)
V. Dinca, Univ. Ovidius Constanta (Romania)
K. Sugiyama, Max-Planck-Institut für Plasmaphysik (Germany)


Published in SPIE Proceedings Vol. 8104:
Nanostructured Thin Films IV
Raúl J. Martín-Palma; Yi-Jun Jen; Tom G. Mackay, Editor(s)

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