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Proceedings Paper

Efficient specification and characterization of surface roughness for extreme ultraviolet optics
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Paper Abstract

EUV mirrors are cutting-edge optical surfaces. Meeting the roughness specifications over the entire range of relevant spatial frequencies is a challenging process. Recent developments that might help to increase the efficiency of EUV mirror production will be discussed including relaxed roughness specifications using the new Generalized Harvey Shack theory as well as a new approach for roughness measurements during and after manufacturing based on light scattering measurements and analysis. The method provides area covering images of the distribution of high-spatial frequency roughness (HSFR) over entire mirrors. Results will be presented for 660 mm diameter EUV collector mirror substrates.

Paper Details

Date Published: 8 April 2011
PDF: 8 pages
Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79692C (8 April 2011); doi: 10.1117/12.891280
Show Author Affiliations
Sven Schröder, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Marcus Trost, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Torsten Feigl, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
James E. Harvey, CREOL, Univ. of Central Florida (United States)
Angela Duparré, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)


Published in SPIE Proceedings Vol. 7969:
Extreme Ultraviolet (EUV) Lithography II
Bruno M. La Fontaine; Patrick P. Naulleau, Editor(s)

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