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Proceedings Paper

Automated CD-SEM recipe creation technology for mass production using CAD data
Author(s): Toshikazu Kawahara; Masamichi Yoshida; Masashi Tanaka; Sanyu Ido; Hiroyuki Nakano; Naokaka Adachi; Yuichi Abe; Wataru Nagatomo
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Paper Abstract

Critical Dimension Scanning Electron Microscope (CD-SEM) recipe creation needs sample preparation necessary for matching pattern registration, and recipe creation on CD-SEM using the sample, which hinders the reduction in test production cost and time in semiconductor manufacturing factories. From the perspective of cost reduction and improvement of the test production efficiency, automated CD-SEM recipe creation without the sample preparation and the manual operation has been important in the production lines. For the automated CD-SEM recipe creation, we have introduced RecipeDirector (RD) that enables the recipe creation by using Computer-Aided Design (CAD) data and text data that includes measurement information. We have developed a system that automatically creates the CAD data and the text data necessary for the recipe creation on RD; and, for the elimination of the manual operation, we have enhanced RD so that all measurement information can be specified in the text data. As a result, we have established an automated CD-SEM recipe creation system without the sample preparation and the manual operation. For the introduction of the CD-SEM recipe creation system using RD to the production lines, the accuracy of the pattern matching was an issue. The shape of design templates for the matching created from the CAD data was different from that of SEM images in vision. Thus, a development of robust pattern matching algorithm that considers the shape difference was needed. The addition of image processing of the templates for the matching and shape processing of the CAD patterns in the lower layer has enabled the robust pattern matching. This paper describes the automated CD-SEM recipe creation technology for the production lines without the sample preparation and the manual operation using RD applied in Sony Semiconductor Kyusyu Corporation Kumamoto Technology Center (SCK Corporation Kumamoto TEC).

Paper Details

Date Published: 20 April 2011
PDF: 8 pages
Proc. SPIE 7971, Metrology, Inspection, and Process Control for Microlithography XXV, 79712V (20 April 2011); doi: 10.1117/12.890215
Show Author Affiliations
Toshikazu Kawahara, Hitachi High-Technologies Corp. (Japan)
Masamichi Yoshida, Sony Semiconductor Kyushu Corp. (Japan)
Masashi Tanaka, Sony Semiconductor Kyushu Corp. (Japan)
Sanyu Ido, Sony Semiconductor Kyushu Corp. (Japan)
Hiroyuki Nakano, Sony Semiconductor Kyushu Corp. (Japan)
Naokaka Adachi, Hitachi High-Technologies Corp. (Japan)
Yuichi Abe, Hitachi High-Technologies Corp. (Japan)
Wataru Nagatomo, Hitachi High-Technologies Corp. (Japan)


Published in SPIE Proceedings Vol. 7971:
Metrology, Inspection, and Process Control for Microlithography XXV
Christopher J. Raymond, Editor(s)

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