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Proceedings Paper

Modeling the ultrafast optical response of a multilayered sample subject to transient distributed perturbations
Author(s): Denis Mounier; Jean-Marc Breteau; Pascal Picart; Vitalyi Gusev
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Paper Abstract

A method for simulating the transient optical response of a multilayered sample subject to a spatially and temporally varying field distribution is presented. The transient optical response of a sample probed in the reflection configuration, is characterized by the 2x2 Jones transient reflection matrix: ▵R(t)-R-1 (TRM). Signals in transient reflectometry, interferometry, and polarimetry measurements can be readily extracted from the TRM. A matrix formalism based on 4x4 transfer matrix is used for calculating the TRM. The formalism facilitates the simulation of transient phenomena in anisotropic stratified samples in the presence of non-homogeneous perturbing fields like electric, magnetic, and strain fields. Various areas of experimental research may benefit of this matrix formalism: picosecond acoustics, electro-optic sampling, magneto-optic sampling, and others area of research involving fast/ultrafast phenomena in multilayered samples studied with the pump-probe technique.

Paper Details

Date Published: 23 May 2011
PDF: 10 pages
Proc. SPIE 8083, Modeling Aspects in Optical Metrology III, 808317 (23 May 2011); doi: 10.1117/12.889557
Show Author Affiliations
Denis Mounier, Lab. de Physique de l'Etat Condensé, CNRS, Univ. du Maine (France)
École Nationale Supérieure d'Ingénieurs du Mans, Univ. du Maine (France)
Jean-Marc Breteau, Lab. de Physique de l'Etat Condensé, CNRS, Univ. du Maine (France)
Institut Univ. de Technologie, CNRS, Univ. du Maine (France)
Pascal Picart, Lab. d'Acoustique, CNRS, Univ. du Maine (United States)
École Nationale Supérieure d'Ingénieurs du Mans, Univ. du Maine (France)
Vitalyi Gusev, Lab. de Physique de l'Etat Condensé, CNRS, Univ. du Maine (France)
École Nationale Supérieure d'Ingénieurs du Mans, Univ. du Maine (France)


Published in SPIE Proceedings Vol. 8083:
Modeling Aspects in Optical Metrology III
Bernd Bodermann, Editor(s)

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