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Proceedings Paper

Depth sensitive Fourier-Scatterometry for the characterization of sub-100 nm periodic structures
Author(s): V. Ferreras Paz; S. Peterhänsel; Ka. Frenner; W. Osten; A. Ovsianikov; K. Obata; B. Chichkov
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Paper Abstract

Recently Fourier-Scatterometry has become of increasing interest for quantitative wafer metrology. But also in other fields the fast and precise optical characterization of periodical gratings of sub 100 nm size is of great interest. We present the application of Fourier-Scatterometry, extended by the use of the coherent properties of white light for the characterization of sub-wavelength periodic gratings of photosensitive material structured by two-photon polymerization. First a simulation-based sensitivity comparison of Fourier-Scatterometry at one fixed wavelength, Fourier-Scatterometry using a white light light source and also additionally using a reference-branch for white-light-interference has been carried out. The investigated structures include gratings produced by two-photon polymerization of photosensitive material and typical semiconductor test gratings. The simulations were performed using the rigorous-coupled-waveanalysis included in our software package MicroSim. A sensitivity comparison between both methods is presented for the mentioned structure types. We also show our experimental implementation of the measurement setup using a whitelight- laser and a modified microscope with a high-NA (NA: 0.95) objective as well as a Linnik-type reference branch for the phase sensitive measurements. First measurements for the investigation of the performance of this measurement setup are presented for comparison with the simulation results.

Paper Details

Date Published: 23 May 2011
PDF: 9 pages
Proc. SPIE 8083, Modeling Aspects in Optical Metrology III, 80830M (23 May 2011); doi: 10.1117/12.889439
Show Author Affiliations
V. Ferreras Paz, Univ. Stuttgart (Germany)
S. Peterhänsel, Univ. Stuttgart (Germany)
Ka. Frenner, Univ. Stuttgart (Germany)
W. Osten, Univ. Stuttgart (Germany)
A. Ovsianikov, Laser Zentrum Hannover e.V. (Germany)
K. Obata, Laser Zentrum Hannover e.V. (Germany)
B. Chichkov, Laser Zentrum Hannover e.V. (Germany)

Published in SPIE Proceedings Vol. 8083:
Modeling Aspects in Optical Metrology III
Bernd Bodermann, Editor(s)

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