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Proceedings Paper

A scattering matrix interpolation from perturbation method: application to scatterometry for profile control
Author(s): Kofi Edee; Jean-Pierre Plumey; Gérard Granet
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Paper Abstract

The scatterometric and electromagnetic signatures of a pattern are computing with the perturbation method combined with the Fourier Modal Method (FMM) in order to reduce computational time. In electromagnetic point of view, the grating is characterized by its scattering matrix which allows the computation of the reflection and transmission coefficient. A slight variation of profile parameters or electrical ones provides a small fluctuation of the scattering matrix, consequently, an analytical expression of the local behavior of its eigenvectors and eigenvalues can be obtained by using a perturbation method.

Paper Details

Date Published: 23 May 2011
PDF: 7 pages
Proc. SPIE 8083, Modeling Aspects in Optical Metrology III, 80830O (23 May 2011); doi: 10.1117/12.889214
Show Author Affiliations
Kofi Edee, LASMEA, Clermont Univ. and Univ. Blaise Pascal (France)
CNRS, UMR 6602 (France)
Jean-Pierre Plumey, LASMEA, Clermont Univ. and Univ. Blaise Pascal (France)
CNRS, UMR 6602 (France)
Gérard Granet, LASMEA, Clermont Univ. and Univ. Blaise Pascal (France)
CNRS, UMR 6602 (France)


Published in SPIE Proceedings Vol. 8083:
Modeling Aspects in Optical Metrology III
Bernd Bodermann, Editor(s)

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