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Proceedings Paper

Modeling of soft x-ray induced ablation in solids
Author(s): B. Iwan; J. Andreasson; E. Abreu; M. Bergh; C. Caleman; J. Hajdu; N. Tîmneanu
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Paper Abstract

Powerful free electron lasers (FELs) operating in the soft X-ray regime are offering new possibilities for creating and probing materials under extreme conditions. We describe here simulations to model the interaction of a focused FEL pulse with metallic solids (niobium, vanadium, and their deuterides) at 13.5 nm wavelength (92 eV) with peak intensities between 1015 to 1018 W/cm2 and a fixed pulse length of 15 femtoseconds (full width at half maximum). The interaction of the pulse with the metallic solids was modeled with a non-local thermodynamic equilibrium code that included radiation transfer. The calculations also made use of a self-similar isothermal fluid model for plasma expansion into vacuum. We find that the time-evolution of the simulated critical charge density in the sample results in a critical depth that approaches the observed crater depths in an earlier experiment performed at the FLASH free electron laser in Hamburg. The results show saturation in the ablation process at intensities exceeding 1016 W/cm2. Furthermore, protons and deuterons with kinetic energies of several keV have been measured, and these concur with predictions from the plasma expansion model. The results indicate that the temperature of the plasma reached almost 5 million K after the pulse has passed.

Paper Details

Date Published: 19 May 2011
PDF: 9 pages
Proc. SPIE 8077, Damage to VUV, EUV, and X-ray Optics III, 807705 (19 May 2011); doi: 10.1117/12.888988
Show Author Affiliations
B. Iwan, Uppsala Univ. (Sweden)
J. Andreasson, Uppsala Univ. (Sweden)
E. Abreu, Boston Univ. (United States)
M. Bergh, Swedish Defence Research Agency (Sweden)
C. Caleman, Technische Univ. München (Germany)
J. Hajdu, Uppsala Univ. (Sweden)
N. Tîmneanu, Uppsala Univ. (Sweden)


Published in SPIE Proceedings Vol. 8077:
Damage to VUV, EUV, and X-ray Optics III
Libor Juha; Saša Bajt; Richard A. London, Editor(s)

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