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Fabrication and quantitative characterization of super smooth surface with sub-nanometer roughnessFormat | Member Price | Non-Member Price |
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Paper Abstract
There is a growing requirement to use supersmooth surfaces with roughness in the sub-nanometer range. But, to produce
100mm-diameter optical elements with ultra-flat and supersmooth surfaces is still difficult. The fabrication technique
based on continues polishing process is presented to produce flat optical element with extremely smooth surface. During
the fabrication, A concept of "Process Controlling" is introduced, which means the machining of super-smooth surfaces
is considered as a chain consisted of some key nodes, not merely a polishing process. The surface figure is tested using
interferometer and the surface roughness is using interference microscopy and atom force microscopy (AFM)
repectively. Then the Power Spectral Density (PSD) function, including the basic theory and the physical meaning, are
presented to explain the difference of test results, which is measured by optical profiler and AFM with different
parameters. The polynomial fitting results indicate that there is excellent agreement between measurements made by the
two instruments.
Paper Details
Date Published: 18 February 2011
PDF: 4 pages
Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79952O (18 February 2011); doi: 10.1117/12.888916
Published in SPIE Proceedings Vol. 7995:
Seventh International Conference on Thin Film Physics and Applications
Junhao Chu; Zhanshan Wang, Editor(s)
PDF: 4 pages
Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79952O (18 February 2011); doi: 10.1117/12.888916
Show Author Affiliations
Zhengxiang Shen, Tongji Univ. (China)
Bin Ma, Tongji Univ. (China)
Tao Ding, Tongji Univ. (China)
Xiaoqiang Wang, Tongji Univ. (China)
Bin Ma, Tongji Univ. (China)
Tao Ding, Tongji Univ. (China)
Xiaoqiang Wang, Tongji Univ. (China)
ZhanShan Wang, Tongji Univ. (China)
Lishuan Wang, Jinhang Institute of Technical Physics (China)
Huasong Liu, Tongji Univ. (China)
Jinhang Institute of Technical Physics (China)
Yiqin Ji, Tongji Univ. (China)
Jinhang Institute of Technical Physics (China)
Lishuan Wang, Jinhang Institute of Technical Physics (China)
Huasong Liu, Tongji Univ. (China)
Jinhang Institute of Technical Physics (China)
Yiqin Ji, Tongji Univ. (China)
Jinhang Institute of Technical Physics (China)
Published in SPIE Proceedings Vol. 7995:
Seventh International Conference on Thin Film Physics and Applications
Junhao Chu; Zhanshan Wang, Editor(s)
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