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Proceedings Paper

Effect of deposition rate on the DUV/VUV reflectance of MgF2protected aluminum mirrors with e-beam evaporation
Author(s): Tong-tong Wang; Jin-song Gao
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Paper Abstract

Aluminum mirrors were freshly fabricated under optimum conditions protected with MgF2 at various deposition rates which evaporated by e-beam. All the samples were deposited on fine polished fused silica substrate. The reflectance results were measured by Mcpherson Vuvas2000 spectrometer in DUV/VUV spectral region from 150nm to 350nm. The highest reflectance is chosen to 210nm, and the point of 160nm is also very important for the project, so the results of two points are detailed presented. The highest average reflectance is about 86.76% with the MgF2 deposition rate at 1.2nm/s. The effects of aging on the reflectance of the MgF2 protected aluminum mirrors are discussed.

Paper Details

Date Published: 18 February 2011
PDF: 4 pages
Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79952B (18 February 2011); doi: 10.1117/12.888553
Show Author Affiliations
Tong-tong Wang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Jin-song Gao, Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 7995:
Seventh International Conference on Thin Film Physics and Applications
Junhao Chu; Zhanshan Wang, Editor(s)

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