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Proceedings Paper

Development of the precision long-stroke 3-DOF nano-stage for the photonic crystal process
Author(s): Wen-Yuh Jywe; Chien-Hung Liu; Bor-Jeng Lin; Meng-Tse Lee; Jeng-Dao Lee; Yun-Feng Teng; Tung-Hsien Hsieh
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Paper Abstract

In this paper, it develops a precision long-stroke 3-DOF nano-stage for the nano photonic crystal process. It integrates a linear motor driven long-stroke stage, a piezoelectric driven three-degrees-of-freedom (3-DOF) nano stage, multi-degrees-of-freedom (MDOF) laser interferometer measurement system and their control systems. The long-stroke nano-stage is a hybrid precision stage that can provide long-stroke and high precision positioning. The common focus horizon regulation system is used to keep the parallelism between writing instrument and the target while the laser direct writing instrument is used to write the nano structure needed. Furthermore, the automatic focusing and horizon control system can compensate the defocusing and angular errors that caused by machining automatically. With this precision 3-DOF nano-stage, the laser direct writing system can improve the process speed, overcome the optical limit of interference to reduce the writing spot, generate arbitrary patterns.

Paper Details

Date Published: 27 May 2011
PDF: 6 pages
Proc. SPIE 7997, Fourth International Seminar on Modern Cutting and Measurement Engineering, 79972X (27 May 2011); doi: 10.1117/12.888361
Show Author Affiliations
Wen-Yuh Jywe, National Formosa Univ. (Taiwan)
Chien-Hung Liu, National Formosa Univ. (Taiwan)
Bor-Jeng Lin, National Formosa Univ. (Taiwan)
Meng-Tse Lee, National Formosa Univ. (Taiwan)
Jeng-Dao Lee, National Formosa Univ. (Taiwan)
Yun-Feng Teng, National Formosa Univ. (Taiwan)
Tung-Hsien Hsieh, National Formosa Univ. (Taiwan)


Published in SPIE Proceedings Vol. 7997:
Fourth International Seminar on Modern Cutting and Measurement Engineering

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