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Proceedings Paper

Thermal properties, optical and interface characterization of Mg/Co multilayers for the EUV range
Author(s): M.-H. Hu; K. Le Guen; J.-M. André; P. Jonnard; S. K. Zhou; H. Ch. Li; J. T. Zhu; Z. S. Wang; N. Mahne; A. Giglia; S. Nannarone
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Paper Abstract

We present the results of the thermal stability of Mg/Co multilayers in the EUV range. The annealing study is performed up to a temperature of 400°C. The X-ray reflectivity at 0.154 nm is used in order to determine the structural parameters (thickness, roughness and density) of the layers. The measurements of the EUV reflectivity around 25 nm show that the reflectivity decreases when the annealing temperature increases above 300°C. X-ray emission spectroscopy is performed to determine the chemical state of the Mg atoms within the Mg/Co multilayer. The results show a small oxidation after annealing at 305°C, which increases greatly at 400°C. Scanning electron microscopy images of cross sections of the multilayer show a change of the surface morphology above 305°C. This large change of morphology and the oxidation explain the large reflectivity loss.

Paper Details

Date Published: 18 February 2011
PDF: 4 pages
Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79950P (18 February 2011); doi: 10.1117/12.888261
Show Author Affiliations
M.-H. Hu, Lab. Chimie Physique - Matière et Rayonnement, CNRS (France)
K. Le Guen, Lab. Chimie Physique - Matière et Rayonnement, CNRS (France)
J.-M. André, Lab. Chimie Physique - Matière et Rayonnement, CNRS (France)
P. Jonnard, Lab. Chimie Physique - Matière et Rayonnement, CNRS (France)
S. K. Zhou, Tongji Univ. (China)
H. Ch. Li, Tongji Univ. (China)
J. T. Zhu, Tongji Univ. (China)
Z. S. Wang, Tongji Univ. (China)
N. Mahne, Istituto Officina dei Materiali, CNR, Lab. TASC (Italy)
A. Giglia, Istituto Officina dei Materiali, CNR, Lab. TASC (Italy)
S. Nannarone, Istituto Officina dei Materiali, CNR, Lab. TASC (Italy)


Published in SPIE Proceedings Vol. 7995:
Seventh International Conference on Thin Film Physics and Applications

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