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Proceedings Paper

Extreme ultraviolet reflective multilayers at 30.4nm
Author(s): Wenjuan Wu; Jingtao Zhu; Fengli Wang; Zhong Zhang; Hongchang Wang; Shumin Zhang; Zhanshan Wang; Lingyan Chen; Hongjun Zhou; Tonglin Huo
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Paper Abstract

Mutilayers are important optical elements and widely used for extreme ultraviolet astronomical observation. For selecting the emission line multilayers should have high reflectivity and narrow spectral bandwidth. In this paper, six different multilayers including Si/C, Si/B4C, Si/Mo/B4C, Si/SiC, Mg/SiC and Mo/Si were designed for normal incidence angle of 5° at He-IIemission line(λ=30.4 nm). These multilayers have been fabricated using a direct current magnetron sputtering system. The period of multilayers were measured by X-ray diffractometer(XRD) and the reflectivities were measured on National Synchrotron Radiation Facility in Hefei, China. Then the reflectivities and the spectral bandwidth of these multilayers were compared respectively. It shows that the spectral bandwidth of multilayers of low Z materials is narrower than that of the normal Mo/Si multiayer, the reflectivity of Si/Mo/B4C multilayer is higher than that of Si-based multilayers of two kinds of materials. And Mg/SiC multilayer has the highest reflectivity of 43.81% and the narrowest spectral bandwidth of 1.44nm, which proves that Mg/SiC multilayer is more potential for selecting the emission line in extreme ultraviolet solar physics.

Paper Details

Date Published: 18 February 2011
PDF: 4 pages
Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79950Z (18 February 2011); doi: 10.1117/12.888159
Show Author Affiliations
Wenjuan Wu, Shanghai Institute of Technology (China)
Jingtao Zhu, Tongji Univ. (China)
Fengli Wang, Tongji Univ. (China)
Zhong Zhang, Tongji Univ. (China)
Hongchang Wang, Tongji Univ. (China)
Shumin Zhang, Tongji Univ. (China)
Zhanshan Wang, Tongji Univ. (China)
Lingyan Chen, Tongji Univ. (China)
Hongjun Zhou, Univ. of Science and Technology of China (China)
Tonglin Huo, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 7995:
Seventh International Conference on Thin Film Physics and Applications
Junhao Chu; Zhanshan Wang, Editor(s)

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