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Proceedings Paper

The influence of micron-sized nodules on the electric-field districution in thin-film polarizers
Author(s): Naibo Chen; Yonggang Wu; Zhenhua Wang; Leijie Ling; Zihuan Xia; Heyun Wu; Gang Lv
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Paper Abstract

The influence of micron-sized nodules on the electric-field enhancement in the HfO2/SiO2 thin-film polarizers with non-quarter- wave layers at 1053nm and 56° is studied using the finite-difference time-domain electromagnetic modeling. The theoretical results show that the electric-field enhancements in HfO2 material are greater at s polarization than those at ppolarization. Nodular defect originating from the large, shallow seed leads to the highest electric-field enhancement while that containing the small, deep seed leads to the lowest electric-field enhancement. The TFP coating designed with the electric-field peaks located in the SiO2 layers has no obvious advantage in decreasing the laser-induced damage than that designed with the electric-field peaks located in the HfO2 layers, once they have the similar nodular defects in them.

Paper Details

Date Published: 18 February 2011
PDF: 4 pages
Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79950Q (18 February 2011); doi: 10.1117/12.887565
Show Author Affiliations
Naibo Chen, Tongji Univ. (China)
Zhejiang Univ.y of Technology (China)
Yonggang Wu, Tongji Univ. (China)
Zhenhua Wang, Tongji Univ. (China)
Leijie Ling, Tongji Univ. (China)
Zihuan Xia, Tongji Univ. (China)
Heyun Wu, Tongji Univ. (China)
Gang Lv, Tongji Univ. (China)


Published in SPIE Proceedings Vol. 7995:
Seventh International Conference on Thin Film Physics and Applications
Junhao Chu; Zhanshan Wang, Editor(s)

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