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Proceedings Paper

Preparation and characterization of tungsten oxide thin films with high electrochromic performance
Author(s): Gang Lv; Yonggang Wu; Heyun Wu; Leijie Ling; Zihuan Xia
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Paper Abstract

Tungsten oxide thin films were prepared by depositing WO3 onto glass substrates coated with ITO using reactive evaporation process at ambient temperature and 200°C respectively. The thin films were grown at different deposition rate. Chronoamperometry was carried out and spectral measurements were performed in situ. Results showed that the thin films prepared at low deposition rates possess higher coloration efficiency (CE), and the thin films grown at ambient temperature have high CE than those grown at 200°C. The origin of the differences in coloration efficiency of the thin films were analyzed and discussed based on the electrochromic mechanism of amorphous tungsten oxide films. The samples morphology was characterized by atom force microscopy (AFM).

Paper Details

Date Published: 18 February 2011
PDF: 4 pages
Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79951C (18 February 2011); doi: 10.1117/12.887560
Show Author Affiliations
Gang Lv, Tongji Univ. (China)
Yonggang Wu, Tongji Univ. (China)
Heyun Wu, Tongji Univ. (China)
Leijie Ling, Tongji Univ. (China)
Zihuan Xia, Tongji Univ. (China)


Published in SPIE Proceedings Vol. 7995:
Seventh International Conference on Thin Film Physics and Applications

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