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Proceedings Paper

Technologies for manufacturing of high angular resolution multilayer coated optics for the New Hard X-ray Mission
Author(s): A. Orlandi; S. Basso; G. Borghi; R. Binda; O. Citterio; G. Grisoni; J. Kools; F. Marioni; N. Missaglia; B. Negri; R. Negri; G. Pareschi; L. Raimondi; A. Ritucci; B. Salmaso; G. Sironi; D. Spiga; R. Subranni; G. Tagliaferri; G. Valsecchi; D. Vernani
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Paper Abstract

In the frame of the technology development to be used for the Optical Payload of next future X-ray missions (such as e.g. New Hard X-ray Mission-ASI), a new set of manufacturing techniques were finalized by Media Lario Technologies (MLT), in collaboration with the Italian Space Agency (ASI) and the Brera Astronomical Observatory (INAF/OAB). The set of new technologies includes master manufacturing machines and processes, electroforming method, a vertical optical bench and metrology machines to support manufacturing and integration of mirrors. A magnetron sputtering PVD machine was upgraded and a Pt/C development study has been performed on the basis of the W/Si results obtained in the first phase of the study. New manufacturing technologies for highly accurate masters were developed and tested by mean of two full-size masters together with several dummies. A number of ultrathin Nickel-Cobalt focusing mirrors were manufactured via galvanic replication process from the masters and coated with Pt/C multilayer. Tests on substrate material, roughness and shape of the shell together with analysis on specimens were performed. Tests with AFM and XRR supported the development of the Pt/C multilayer which is the enabling technology for focusing high energy X-Rays. Several mirror shells were integrated into two demonstrator modules to assess the whole manufacturing process up to optical payload integration. The summary of the results from manufacturing and testing of specimens and mirror shells is reported in this paper together with a description of the technologies now available at MLT.

Paper Details

Date Published: 4 May 2011
PDF: 13 pages
Proc. SPIE 8076, EUV and X-Ray Optics: Synergy between Laboratory and Space II, 807606 (4 May 2011); doi: 10.1117/12.887339
Show Author Affiliations
A. Orlandi, Media Lario Technologies (Italy)
S. Basso, INAF, Osservatorio Astronomico di Brera (Italy)
G. Borghi, Media Lario Technologies (Italy)
R. Binda, Media Lario Technologies (Italy)
O. Citterio, Media Lario Technologies (Italy)
INAF, Brera Astronomical Observatory (Italy)
G. Grisoni, Media Lario Technologies (Italy)
J. Kools, Media Lario Technologies (Italy)
F. Marioni, Media Lario Technologies (Italy)
N. Missaglia, Media Lario Technologies (Italy)
B. Negri, Agenzia Spaziale Italiana (Italy)
R. Negri, INAF, Osservatorio Astronomico di Brera (Italy)
G. Pareschi, INAF, Osservatorio Astronomico di Brera (Italy)
L. Raimondi, INAF, Osservatorio Astronomico di Brera (Italy)
Univ. dell' Insubria (Italy)
A. Ritucci, Media Lario Technologies (Italy)
B. Salmaso, INAF, Osservatorio Astronomico di Brera (Italy)
G. Sironi, INAF, Osservatorio Astronomico di Brera (Italy)
D. Spiga, INAF, Osservatorio Astronomico di Brera (Italy)
R. Subranni, Media Lario Technologies (Italy)
G. Tagliaferri, INAF, Osservatorio Astronomico di Brera (Italy)
G. Valsecchi, Media Lario Technologies (Italy)
D. Vernani, Media Lario Technologies (Italy)


Published in SPIE Proceedings Vol. 8076:
EUV and X-Ray Optics: Synergy between Laboratory and Space II
René Hudec; Ladislav Pina, Editor(s)

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