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Proceedings Paper

Development of capacitive RF MEMS switches with TaN and Ta2O5 thin films
Author(s): Anna Persano; Fabio Quaranta; Adriano Cola; Giorgio De Angelis; Romolo Marcelli; Pietro Siciliano
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Paper Abstract

We develop shunt capacitive RF MEMS switches in III-V technology making use of materials which can be alternative to the ones commonly used, in order to overcome some technological constraints concerning the RF MEMS reliability. Specifically, we evaluate the potential of tantalum nitride (TaN) and tantalum pentoxide (Ta2O5) to be used for the switches actuation pads and dielectric layers, respectively. To this scope, a compositional, structural and electrical characterization of TaN and Ta2O5 films as a function of the deposition parameters, such as the substrate temperature and the sputtering mixture composition, is performed. The realized switches show good actuation voltages, in the range 15- 20 V, an insertion loss better than -0.8 dB up to 30 GHz, and an isolation of ~ -40 dB at the resonant frequency. A comparison between the measured S-parameter values and the results of a circuit simulation is also presented and discussed, providing useful information on the operation of the fabricated switches.

Paper Details

Date Published: 5 May 2011
PDF: 6 pages
Proc. SPIE 8066, Smart Sensors, Actuators, and MEMS V, 80660V (5 May 2011); doi: 10.1117/12.886715
Show Author Affiliations
Anna Persano, IMM-CNR, Institute for Microelectronics and Microsystems (Italy)
Fabio Quaranta, IMM-CNR, Institute for Microelectronics and Microsystems (Italy)
Adriano Cola, IMM-CNR, Institute for Microelectronics and Microsystems (Italy)
Giorgio De Angelis, IMM-CNR, Institute for Microelectronics and Microsystems (Italy)
Romolo Marcelli, IMM-CNR, Institute for Microelectronics and Microsystems (Italy)
Pietro Siciliano, IMM-CNR, Institute for Microelectronics and Microsystems (Italy)


Published in SPIE Proceedings Vol. 8066:
Smart Sensors, Actuators, and MEMS V
Ulrich Schmid; José Luis Sánchez-Rojas; Monika Leester-Schaedel, Editor(s)

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