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Proceedings Paper

Thin film thickness and refractive index measurement by multiple beam interferometry and fast spectral correlation method
Author(s): Terry Yuan-Fang Chen; Chien-Chih Chen
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Paper Abstract

The establishment and use of precision measurement technology and system become an important part to understand and to effectively control the materials, structures or installations in nano-scale. In this paper, a system based on the multiple beam interferometry, multi-matrix method and fast spectral correlation method is developed to measure the thickness and refractive index of thin film. Primary study to analyze the FECO images obtained from symmetrical three-layer (micaair- mica) with film thickness over 200nm and non-symmetrical interference (mica- air- LDPE-mica) was made. The results show that the fast spectral correlation formula can be applied to both symmetric and non-symmetric three-layer interference, and the film thickness measurement is applicable to over 200nm.

Paper Details

Date Published: 31 December 2010
PDF: 7 pages
Proc. SPIE 7544, Sixth International Symposium on Precision Engineering Measurements and Instrumentation, 754449 (31 December 2010); doi: 10.1117/12.885457
Show Author Affiliations
Terry Yuan-Fang Chen, National Cheng Kung Univ. (Taiwan)
Chien-Chih Chen, National Cheng Kung Univ. (Taiwan)


Published in SPIE Proceedings Vol. 7544:
Sixth International Symposium on Precision Engineering Measurements and Instrumentation
Jiubin Tan; Xianfang Wen, Editor(s)

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