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Proceedings Paper

A design of beam shaping unit for 193nm lithography illumination system using angular spectrum theory
Author(s): Yang Zhao; Yan Gong; Shun Li; Wei Zhang
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Paper Abstract

Off-axis illumination (OAI) technology is widely used to enhance resolution for deep ultraviolet lithography. The realizing methods of OAI include geometrical optics method and physical optics method. However, the former has the disadvantage of weak intensity distribution controlling ability, and the latter introduces simulation errors evidently when dealing with near field diffraction propagation. A diffractive optical element (DOE) designing method using plane wave angular spectrum theory is presented in this paper. Several kinds of OAI modes at near field away from DOE can be realized, and simulation errors and the size of illuminator are also reduced. According to studying the relationships of the sampling point distance of DOE, light beam propagation distance, and the structure of the beam shaping unit, a method of determining the designing parameters is discussed. Using this method, several illumination modes are realized, and simulation results show that all diffraction efficiencies reach up to 84%. The method of DOE manufacturing is analyzed at last, and it is proven to be feasible.

Paper Details

Date Published: 31 December 2010
PDF: 8 pages
Proc. SPIE 7544, Sixth International Symposium on Precision Engineering Measurements and Instrumentation, 75443Z (31 December 2010); doi: 10.1117/12.885296
Show Author Affiliations
Yang Zhao, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of the Chinese Academy of Sciences (China)
Yan Gong, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Shun Li, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of the Chinese Academy of Sciences (China)
Wei Zhang, Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 7544:
Sixth International Symposium on Precision Engineering Measurements and Instrumentation
Jiubin Tan; Xianfang Wen, Editor(s)

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