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Proceedings Paper

Modeling and simulation of through-focus images for dimensional analysis of nanoscale structures
Author(s): Xiuguo Chen; Shiyuan Liu; Chuanwei Zhang; Yuan Ma; Jinlong Zhu
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Paper Abstract

In this paper, the through-focus scanning technique using a conventional bright-field optical microscope is introduced for nanoscale dimensional analysis with nanometer sensitivity. This technique uses a set of through-focus image maps (TFIMs) obtained at different focus positions instead of one 'best-focus' image and considers the through-focus image as a unique 'signal' that represents the target. The boundary element method (BEM) and the rigorous coupled-wave analysis (RCWA) method were applied to simulate the optical responses and to obtain the TFIMs of finite aperiodic and infinite periodic structures, respectively. The sensitivity of the through-focus technique for the nanoscale dimensional changes of targets was analyzed by using the differential through-focus image maps (DTFIMs). The simulation results validate the use of this technique for nanoscale metrology.

Paper Details

Date Published: 31 December 2010
PDF: 9 pages
Proc. SPIE 7544, Sixth International Symposium on Precision Engineering Measurements and Instrumentation, 75446C (31 December 2010); doi: 10.1117/12.885232
Show Author Affiliations
Xiuguo Chen, Huazhong Univ. of Science and Technology (China)
Shiyuan Liu, Huazhong Univ. of Science and Technology (China)
Chuanwei Zhang, Huazhong Univ. of Science and Technology (China)
Yuan Ma, Huazhong Univ. of Science and Technology (China)
Jinlong Zhu, Huazhong Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 7544:
Sixth International Symposium on Precision Engineering Measurements and Instrumentation
Jiubin Tan; Xianfang Wen, Editor(s)

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