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Proceedings Paper

Narrow spectral bandwidth EUV multilayers: fabrication and performance
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Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79692B; doi: 10.1117/12.884664
Show Author Affiliations
Farhad H. Salmassi, Lawrence Berkeley National Lab. (United States)
Eric M. Gullikson, Lawrence Berkeley National Lab. (United States)
Yanwei Liu, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 7969:
Extreme Ultraviolet (EUV) Lithography II
Bruno M. La Fontaine; Patrick P. Naulleau, Editor(s)

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