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Proceedings Paper

Particle number density gradient samples for nanoparticle metrology with atomic force microscopy
Author(s): Malcolm A. Lawn; Renee V. Goreham; Jan Herrmann; Asa K. Jämting
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Paper Abstract

Atomic force microscopy (AFM) can provide a link in the traceability chain between dimensional measurement techniques for nanoparticles, such as dynamic light scattering and differential centrifugal sedimentation, and the realization of the definition of the SI metre. Despite the size of nanoparticles being well within the resolution range of typical AFMs, the accurate measurement of nanoparticles with AFM presents a number of challenges. One of these challenges is the number density of particles deposited on substrates for AFM imaging and measurement. If the number density is too low, it is difficult to obtain adequate measurement statistics, whereas a number density that is too high can result in particle agglomeration on the substrate and make it difficult to image sufficient substrate area to obtain a reliable reference for height measurements. We present imaging and measurement results of 16 nm gold nanoparticles deposited on a substrate functionalized to produce a surface with a number density gradient across the sample. This substrate functionalization shows great potential for achieving reliable and efficient nanoparticle metrology with AFM.

Paper Details

Date Published: 1 June 2011
PDF: 8 pages
Proc. SPIE 8036, Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences, 80360T (1 June 2011); doi: 10.1117/12.884566
Show Author Affiliations
Malcolm A. Lawn, National Measurement Institute (Australia)
Renee V. Goreham, Univ. of South Australia (Australia)
Jan Herrmann, National Measurement Institute (Australia)
Asa K. Jämting, National Measurement Institute (Australia)


Published in SPIE Proceedings Vol. 8036:
Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences
Michael T. Postek; Dale E. Newbury; S. Frank Platek; David C. Joy; Tim K. Maugel, Editor(s)

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