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Proceedings Paper

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Author(s): Robert Socha
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Paper Abstract

The effect of the source pixel intensity and polarization on imaging is analyzed. The pixilated source is an artifact of the discrete overlapping diffraction orders from the pupil stop of the illumination and from the pupil stop of the projection lens. The intensity of the discrete source pixels is sensitive to the image log slope (ILS) and the mask error enhancement factor (MEEF). There are trade-offs between minimizing the MEEF and maximizing the process window (PW). The pixilated source intensity allows one to better balance these trade-offs. Although the source intensity has a large effect on MEEF and PW, mixed polarization states of XY and transverse magnetic (TM) or of transverse electric (TE) and TM have limited value because of low k1 sampling of the projection lens and because effects of the wafer stack of thin-films dominate.

Paper Details

Date Published: 23 March 2011
PDF: 17 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 797305 (23 March 2011); doi: 10.1117/12.883317
Show Author Affiliations
Robert Socha, ASML (United States)


Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

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