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Proceedings Paper

IBF technology for nanomanufacturing technology
Author(s): T. Franz; T. Hänsel
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Paper Abstract

Ultra precise figure error correction of optics whether down to the sub-nm RMS level or time-saving with nm-RMS accuracy by using three axes IBF-plants.

Paper Details

Date Published: 7 October 2010
PDF: 4 pages
Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 765513 (7 October 2010); doi: 10.1117/12.883031
Show Author Affiliations
T. Franz, NTG Neue Technologien GmbH & Co. KG (Germany)
T. Hänsel, Leibniz-Institut für Oberflächenmodifizierung e.V. (Germany)


Published in SPIE Proceedings Vol. 7655:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Yoshiharu Namba; David D. Walker; Shengyi Li, Editor(s)

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