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Proceedings Paper

Solvent development processing of chemically amplified resists: chemistry, physics, and polymer science considerations
Author(s): Christopher K. Ober; Christine Ouyang; Jin-Kyun Lee; Marie Krysak
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Paper Abstract

Solvent development of chemically amplified (CA), negative tone photoresists depends on several factors including molecular weight of the photoresist, the strength of polymer-solvent interactions, and the strength of polymer-polymer interactions in the undeveloped regions. Absent are the ionic interactions present in the aqueous base development of CA resists that greatly aids dissolution and image contrast. In its place, strong hydrogen bonding of the exposed photoresist leads to effective resistance to dissolution in non-polar developers. These effects are discussed in the context of Flory- Huggins theory. As part of a study of low environmental impact developers several, non-polar solvents have been investigated with negative tone, chemically amplified photoresists. These include supercritical CO2, hydrofluoroethers and silicone fluids. Each of these solvents has low surface energy, unique dissolution characteristics and is capable of developing sub-50 nm patterns. Performance aspects of these developers will be described.

Paper Details

Date Published: 15 April 2011
PDF: 8 pages
Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 797205 (15 April 2011); doi: 10.1117/12.882959
Show Author Affiliations
Christopher K. Ober, Cornell Univ. (United States)
Christine Ouyang, Cornell Univ. (United States)
Jin-Kyun Lee, Inha Univ. (Korea, Republic of)
Marie Krysak, Cornell Univ. (United States)


Published in SPIE Proceedings Vol. 7972:
Advances in Resist Materials and Processing Technology XXVIII
Robert D. Allen; Mark H. Somervell, Editor(s)

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