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Proceedings Paper

pH-dependent mechanisms of electromechanical cartilage reshaping
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Paper Abstract

Electromechanical reshaping of cartilage is a novel modality that has significant clinical applications in otolaryngology and plastic surgery. Although EMR dosimetry has been extensively studied, little is known about the mechanisms of EMR, of which local tissue pH changes is believed to play a role. In this study, rabbit nasal septal cartilage is subject to a number of experiments aimed at elucidating pH-related changes using phenol red. The lateral extent and magnitude of pH change as well as factors that impact pH change are studied. Increasing voltage and application appear to increase the area and intensity of color change. With parameters known to produce thermal tissue injury, a transitional zone likely representing a confluence of acid-base products is noted in the region around the bend axis. Furthermore, rehydration and pH indicator application time do not appear to play a role in the quality of pH change. These simple experiments may provide insight into the role of pH changes in EMR that may allow correlation of dosimetry to tissue damage, further optimizing the clinical potential of EMR.

Paper Details

Date Published: 17 February 2011
PDF: 6 pages
Proc. SPIE 7883, Photonic Therapeutics and Diagnostics VII, 78832U (17 February 2011); doi: 10.1117/12.882950
Show Author Affiliations
Edward C. Wu, Beckman Laser Institute (United States)
Cyrus T. Manuel, Beckman Laser Institute (United States)
Dmitriy E. Protsenko, Beckman Laser Institute (United States)
Koohyar Karimi, Beckman Laser Institute (United States)
Ashley Hamamoto, Beckman Laser Institute (United States)
Brian J. F. Wong, Beckman Laser Institute (United States)

Published in SPIE Proceedings Vol. 7883:
Photonic Therapeutics and Diagnostics VII
Kenton W. Gregory M.D.; Nikiforos Kollias; Andreas Mandelis; Henry Hirschberg M.D.; Hyun Wook Kang; Anita Mahadevan-Jansen; Brian Jet-Fei Wong M.D.; Justus F. R. Ilgner M.D.; Bodo E. Knudsen M.D.; E. Duco Jansen; Steen J. Madsen; Guillermo J. Tearney; Bernard Choi; Haishan Zeng; Laura Marcu, Editor(s)

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