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Proceedings Paper

High accuracy laser based machine vision for calibration of linear encoders and dial instruments
Author(s): Iuliana Iordache; Paul Schiopu; Dan Apostol; Victor Damian
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Paper Abstract

A laser interferometer, a vision system, and 1-D precision translation stage are used to develop a high precision measuring station with a working range of 12 mm. The object inspected by the laser-and-vision system is moved using a linear translation stage (LUMINOS INDUSTRIES I1000 - 1-Axis Stage) so that the camera can take images of the feature points of the object at two (or more) different positions. Meanwhile, the displacement of the table is measured using a laser interferometer. Putting these two feature points successively in focus the distance between them can be evaluated and adding the displacement measured by the laser interferometer, the real distance between these two feature points is obtained. The developed 1-D laser-and-vision measuring system is used to measure the geometric size (pitch) of grating type linear encoders or industrial line scales. Software counts automatically the number of lines and the laser interferometer produces the corresponding length. For dial instruments the vision machine observes the coincidence of the moving needle with divisions representing (sub) units of length. The displacements measured by laser interferometer are compared with dial indicator and the measuring errors are observed.

Paper Details

Date Published: 8 December 2010
PDF: 5 pages
Proc. SPIE 7821, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies V, 782125 (8 December 2010); doi: 10.1117/12.882819
Show Author Affiliations
Iuliana Iordache, National Institute for Lasers, Plasma and Radiation Physics (Romania)
Paul Schiopu, Politehnica Univ. of Bucharest (Romania)
Dan Apostol, National Institute for Lasers, Plasma and Radiation Physics (Romania)
Victor Damian, National Institute for Lasers, Plasma and Radiation Physics (Romania)


Published in SPIE Proceedings Vol. 7821:
Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies V

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