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Proceedings Paper

Hierarchical kernel generation for SMO application
Author(s): Jason Hsih-Chie Chang; Charlie Chung-Ping Chen; Lawrence S. Melvin
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Paper Abstract

Resolution enhancement technologies (RETs) are so far widely proposed in improving the quality of micro-lithography process. Latest method such as source mask optimization (SMO) is gaining popularity recently. Therefore, high speed simulator is in strong demand for growing computational complexity of RETs. In this work, we demonstrate that our Abbe-PCA method is highly efficient for source configuring and mask tuning using hierarchical pixel-based OPC.

Paper Details

Date Published: 23 March 2011
PDF: 7 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 797323 (23 March 2011); doi: 10.1117/12.882808
Show Author Affiliations
Jason Hsih-Chie Chang, National Taiwan Univ. (Taiwan)
Charlie Chung-Ping Chen, National Taiwan Univ. (Taiwan)
Lawrence S. Melvin, Synopsys Inc. (Taiwan)


Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

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