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Proceedings Paper

History of magnetorheological finishing
Author(s): Daniel C. Harris
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Paper Abstract

Magnetorheological finishing (MRF) is a deterministic method for producing complex optics with figure accuracy <50 nm and surface roughness <1 nm. MRF was invented at the Luikov Institute of Heat and Mass Transfer in Minsk, Belarus in the late 1980s by a team led by William Kordonski. When the Soviet Union opened up, New York businessman Lowell Mintz was invited to Minsk in 1990 to explore possibilities for technology transfer. Mintz was told of the potential for MRF, but did not understand whether it had value. Mintz was referred to Harvey Pollicove at the Center for Optics Manufacturing of the University of Rochester. As a result of their conversation, they sent Prof. Steve Jacobs to visit Minsk and evaluate MRF. From Jacobs' positive findings, and with support from Lowell Mintz, Kordonski and his colleagues were invited in 1993 to work at the Center for Optics Manufacturing with Jacobs and Don Golini to refine MRF technology. A "preprototype" finishing machine was operating by 1994. Prof. Greg Forbes and doctoral student Paul Dumas developed algorithms for deterministic control of MRF. In 1996, Golini recognized the commercial potential of MRF, secured investment capital from Lowell Mintz, and founded QED Technologies. The first commercial MRF machine was unveiled in 1998. It was followed by more advanced models and by groundbreaking subaperture stitching interferometers for metrology. In 2006, QED was acquired by and became a division of Cabot Microelectronics. This paper recounts the history of the development of MRF and the founding of QED Technologies.

Paper Details

Date Published: 21 May 2011
PDF: 22 pages
Proc. SPIE 8016, Window and Dome Technologies and Materials XII, 80160N (21 May 2011); doi: 10.1117/12.882557
Show Author Affiliations
Daniel C. Harris, Naval Air Systems Command (United States)


Published in SPIE Proceedings Vol. 8016:
Window and Dome Technologies and Materials XII
Randal W. Tustison, Editor(s)

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