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Proceedings Paper

Nanostructre based antireflection coatings for EO/IR sensor applications
Author(s): Ashok K. Sood; Roger E. Welser; Adam W. Sood; E. James Egerton; Yash R. Puri; David Poxson; Sammer Chhajed Jaehee Cho; E. Fred Schubert; Dennis L. Polla; Nibir K. Dhar; Raymond S. Balcerak; Martin B. Soprano
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Paper Abstract

EO/IR Nanosensors are being developed for a variety of Defense and Commercial Systems Applications. These include UV, Visible, NIR, MWIR and LWIR Nanotechnology based Sensors. The conventional SWIR Sensors use InGaAs based IR Focal Plane Array (FPA) that operate in 1.0-1.8 micron region. Similarly, MWIR Sensors use InSb or HgCdTe based FPA that is sensitive in 3-5 micron region. More recently, there is effort underway to evaluate low cost SiGe visible and near infrared band that covers from 0.4 to 1.6 micron. One of the critical technologies that will enhance the EO/IR sensor performance is the development of high quality nanostructure based antireflection coating. Prof. Fred Schubert and his group have used the TiO2 and SiO2 graded-index nanowires / nanorods deposited by obliqueangle deposition, and, for the first time, demonstrated their potential for antireflection coatings by virtually eliminating Fresnel reflection from an AlN-air interface over the UV band. This was achieved by controlling the refractive index of the TiO2 and SiO2 nanorod layers, down to a minimum value of n = 1.05, the lowest value so far reported In this paper, we will discuss our modeling approach and experimental results for using oblique angle nanowires growth technique for extending the application for UV, Visible and NIR sensors and their utility for longer wavelength application. The AR coating is designed by using a genetic algorithm and fabricated by using oblique angle deposition. The AR coating is designed for the wavelength range of 400 nm to 2500 nm and 0° to 40° angle of incidence. The measured average optical transmittance of an uncoated glass substrate between 1000 nm and 2000 nm is improved from 92.6% to 99.3% at normal incidence by using a two-layer nanostructured AR coating deposited on both surfaces of the glass substrate.

Paper Details

Date Published: 11 February 2011
PDF: 9 pages
Proc. SPIE 7954, Light-Emitting Diodes: Materials, Devices, and Applications for Solid State Lighting XV, 79540W (11 February 2011); doi: 10.1117/12.882535
Show Author Affiliations
Ashok K. Sood, Magnolia Optical Technologies, Inc. (United States)
Roger E. Welser, Magnolia Optical Technologies, Inc. (United States)
Adam W. Sood, Magnolia Optical Technologies, Inc. (United States)
E. James Egerton, Magnolia Optical Technologies, Inc. (United States)
Yash R. Puri, Magnolia Optical Technologies, Inc. (United States)
David Poxson, Rensselaer Polytechnic Institute (United States)
Sammer Chhajed Jaehee Cho, Rensselaer Polytechnic Institute (United States)
E. Fred Schubert, Rensselaer Polytechnic Institute (United States)
Dennis L. Polla, DARPA/MTO (United States)
Nibir K. Dhar, DARPA/MTO (United States)
Raymond S. Balcerak, Raymond S. Balcerak, LLC (United States)
Martin B. Soprano, U.S. Army Research, Development and Engineering Command (United States)


Published in SPIE Proceedings Vol. 7954:
Light-Emitting Diodes: Materials, Devices, and Applications for Solid State Lighting XV
Klaus P. Streubel; Heonsu Jeon; Li-Wei Tu; Norbert Linder, Editor(s)

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