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Proceedings Paper

Laser produced plasma light source for EUVL
Author(s): Igor V. Fomenkov; Alex I. Ershov; William N. Partlo; David W. Myers; Daniel Brown; Richard L. Sandstrom; Bruno La Fontaine; Alexander N. Bykanov; Georgiy O. Vaschenko; Oleh V. Khodykin; Norbert R. Böwering; Palash Das; Vladimir B. Fleurov; Kevin Zhang; Shailendra N. Srivastava; Imtiaz Ahmad; Chirag Rajyaguru; Silvia De Dea; Richard R. Hou; Wayne J. Dunstan; Peter Baumgart; Toshihiko Ishihara; Rod D. Simmons; Robert N. Jacques; Robert A. Bergstedt; David C. Brandt
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Paper Abstract

This paper describes the development of laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source architecture for advanced lithography applications in high volume manufacturing. EUV lithography is expected to succeed 193 nm immersion technology for sub-22 nm critical layer patterning. In this paper we discuss the most recent results from high qualification testing of sources in production. Subsystem performance will be shown including collector protection, out-of-band (OOB) radiation measurements, and intermediate-focus (IF) protection as well as experience in system use. This presentation reviews the experimental results obtained on systems with a focus on the topics most critical for an HVM source.

Paper Details

Date Published: 8 April 2011
PDF: 6 pages
Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 796933 (8 April 2011); doi: 10.1117/12.882210
Show Author Affiliations
Igor V. Fomenkov, Cymer, Inc. (United States)
Alex I. Ershov, Cymer, Inc. (United States)
William N. Partlo, Cymer, Inc. (United States)
David W. Myers, Cymer, Inc. (United States)
Daniel Brown, Cymer, Inc. (United States)
Richard L. Sandstrom, Cymer, Inc. (United States)
Bruno La Fontaine, Cymer, Inc. (United States)
Alexander N. Bykanov, Cymer, Inc. (United States)
Georgiy O. Vaschenko, Cymer, Inc. (United States)
Oleh V. Khodykin, Cymer, Inc. (United States)
Norbert R. Böwering, Cymer, Inc. (United States)
Palash Das, Cymer, Inc. (United States)
Vladimir B. Fleurov, Cymer, Inc. (United States)
Kevin Zhang, Cymer, Inc. (United States)
Shailendra N. Srivastava, Cymer, Inc. (United States)
Imtiaz Ahmad, Cymer, Inc. (United States)
Chirag Rajyaguru, Cymer, Inc. (United States)
Silvia De Dea, Cymer, Inc. (United States)
Richard R. Hou, Cymer, Inc. (United States)
Wayne J. Dunstan, Cymer, Inc. (United States)
Peter Baumgart, Cymer, Inc. (United States)
Toshihiko Ishihara, Cymer, Inc. (United States)
Rod D. Simmons, Cymer, Inc. (United States)
Robert N. Jacques, Cymer, Inc. (United States)
Robert A. Bergstedt, Cymer, Inc. (United States)
David C. Brandt, Cymer, Inc. (United States)


Published in SPIE Proceedings Vol. 7969:
Extreme Ultraviolet (EUV) Lithography II
Bruno M. La Fontaine; Patrick P. Naulleau, Editor(s)

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