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Proceedings Paper

LPP source system development for HVM
Author(s): David C. Brandt; Igor V. Fomenkov; Alex I. Ershov; William N. Partlo; David W. Myers; Richard L. Sandstrom; Bruno M. La Fontaine; Michael J. Lercel; Alexander N. Bykanov; Norbert R. Böwering; Georgiy O. Vaschenko; Oleh V. Khodykin; Shailendra N. Srivastava; Imtiaz Ahmad; Chirag Rajyaguru; Palash Das; Vladimir B. Fleurov; Kevin Zhang; Daniel J. Golich; Silvia De Dea; Richard R. Hou; Wayne J. Dunstan; Christian J. Wittak; Peter Baumgart; Toshihiko Ishihara; Rod D. Simmons; Robert N. Jacques; Robert A. Bergstedt
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Paper Abstract

Laser produced plasma (LPP) systems have been developed as a viable approach for the EUV scanner light sources to support optical imaging of circuit features at sub-22nm nodes on the ITRS roadmap. This paper provides a review of development progress and productization status for LPP extreme-ultra-violet (EUV) sources with performance goals targeted to meet specific requirements from leading scanner manufacturers. The status of first generation High Volume Manufacturing (HVM) sources in production and at a leading semiconductor device manufacturer is discussed. The EUV power at intermediate focus is discussed and the lastest data are presented. An electricity consumption model is described, and our current product roadmap is shown.

Paper Details

Date Published: 7 April 2011
PDF: 8 pages
Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79691H (7 April 2011); doi: 10.1117/12.882208
Show Author Affiliations
David C. Brandt, Cymer, Inc. (United States)
Igor V. Fomenkov, Cymer, Inc. (United States)
Alex I. Ershov, Cymer, Inc. (United States)
William N. Partlo, Cymer, Inc. (United States)
David W. Myers, Cymer, Inc. (United States)
Richard L. Sandstrom, Cymer, Inc. (United States)
Bruno M. La Fontaine, Cymer, Inc. (United States)
Michael J. Lercel, Cymer, Inc. (United States)
Alexander N. Bykanov, Cymer, Inc. (United States)
Norbert R. Böwering, Cymer, Inc. (United States)
Georgiy O. Vaschenko, Cymer, Inc. (United States)
Oleh V. Khodykin, Cymer, Inc. (United States)
Shailendra N. Srivastava, Cymer, Inc. (United States)
Imtiaz Ahmad, Cymer, Inc. (United States)
Chirag Rajyaguru, Cymer, Inc. (United States)
Palash Das, Cymer, Inc. (United States)
Vladimir B. Fleurov, Cymer, Inc. (United States)
Kevin Zhang, Cymer, Inc. (United States)
Daniel J. Golich, Cymer, Inc. (United States)
Silvia De Dea, Cymer, Inc. (United States)
Richard R. Hou, Cymer, Inc. (United States)
Wayne J. Dunstan, Cymer, Inc. (United States)
Christian J. Wittak, Cymer, Inc. (United States)
Peter Baumgart, Cymer, Inc. (United States)
Toshihiko Ishihara, Cymer, Inc. (United States)
Rod D. Simmons, Cymer, Inc. (United States)
Robert N. Jacques, Cymer, Inc. (United States)
Robert A. Bergstedt, Cymer, Inc. (United States)


Published in SPIE Proceedings Vol. 7969:
Extreme Ultraviolet (EUV) Lithography II
Bruno M. La Fontaine; Patrick P. Naulleau, Editor(s)

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