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Proceedings Paper

Designing DWDM multiplexers on SiON wafers
Author(s): Laurentiu Dragnea
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Paper Abstract

I propose an integrated multiplexer/demultiplexer that use a concave blazed diffraction grating on SiON wafer. The paper presents a technology that overcome existing issues regarding implementation of such a microoptic device. Two types of similar integrated systems were developed but both of them have not minimized chromatic, astigmatism and spherical aberrations. Both systems use gold coating for vertical walls of diffraction grating that has reflection index lower than aluminum for wavelength used. Technology proposed in this paper minimizes the chromatic, astigmatism and spherical aberrations. Also is used aluminum for coating of vertical walls of diffraction grating. SiON wafer is etched with Argon plasma through photoresist mask with thickness of 0,8 μm for grating configuration allowing reusing of the photoresist in next stage of coating. This makes possible that coating through liftoff to be aligned to vertical walls of concave diffraction grating, eliminating positioning errors due to coating mask.

Paper Details

Date Published: 3 December 2010
PDF: 6 pages
Proc. SPIE 7821, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies V, 78212I (3 December 2010); doi: 10.1117/12.882195
Show Author Affiliations
Laurentiu Dragnea, Cosmote Romanian Mobile Telecommunications SA (Romania)


Published in SPIE Proceedings Vol. 7821:
Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies V
Paul Schiopu; George Caruntu, Editor(s)

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