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Proceedings Paper

Visualization of the develop process
Author(s): Linda K. Sundberg; Gregory M. Wallraff; Alexander M. Friz; Blake W. Davis; Sally A. Swanson; Phillip J. Brock; Charles T. Rettner; William D. Hinsberg
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Paper Abstract

Variations in critical dimension (CD) as a function of the proximity of an individual feature to other exposed areas are continuing to be a problem in the lithography process. For example, the CD uniformity (CDU) may degrade significantly depending on the proximity to densely or sparsely exposed areas. These pattern density effects will continue to get worse and become more complex as feature sizes decrease. Pattern density effects are believed to arise from several sources and may simultaneously contribute to a net observed CD variation [1]. One such source, develop loading, results in local depletion of developer in highly exposed regions, reducing the dissolution rate and thereby locally affecting CD. In this report we describe our results in visualizing develop loading by using pH sensitive dyes. Two different types of dyes are explored: acid/base pH indicators and a fluorescent dye bound to the resist polymer.

Paper Details

Date Published: 16 April 2011
PDF: 10 pages
Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79720I (16 April 2011); doi: 10.1117/12.882185
Show Author Affiliations
Linda K. Sundberg, IBM Almaden Research Ctr. (United States)
Gregory M. Wallraff, IBM Almaden Research Ctr. (United States)
Alexander M. Friz, IBM Almaden Research Ctr. (United States)
Blake W. Davis, IBM Almaden Research Ctr. (United States)
Sally A. Swanson, IBM Almaden Research Ctr. (United States)
Phillip J. Brock, IBM Almaden Research Ctr. (United States)
Charles T. Rettner, IBM Almaden Research Ctr. (United States)
William D. Hinsberg, IBM Almaden Research Ctr. (United States)


Published in SPIE Proceedings Vol. 7972:
Advances in Resist Materials and Processing Technology XXVIII
Robert D. Allen; Mark H. Somervell, Editor(s)

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