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Proceedings Paper

Laser source for interferometry in nanotechnology
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Paper Abstract

The contribution is oriented towards measuring in the nanoscale through local probe microscopy techniques, primarily the AFM microscopy. The need to make the AFM microscope a nanometrology tool not only the positioning of the tip has to be based on precise measurements but the traceability of the measuring technique has to be ensured up to the primary etalon. This leads to the engagement of laser interferometric measuring methods. We present a design of a single-frequency stabilized laser which serves as a laser source for multiaxis position control of a nanopositioning stage. The laser stabilization technique is described together with comparison of frequency stability.

Paper Details

Date Published: 14 December 2010
PDF: 6 pages
Proc. SPIE 7746, 17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 77461I (14 December 2010); doi: 10.1117/12.882151
Show Author Affiliations
Jan Hrabina, Institute of Scientific Instruments of the ASCR, v.v.i. (Czech Republic)
Josef Lazar, Institute of Scientific Instruments of the ASCR, v.v.i. (Czech Republic)
Ondrej Cip, Institute of Scientific Instruments of the ASCR, v.v.i. (Czech Republic)
Martin Cizek, Institute of Scientific Instruments of the ASCR, v.v.i. (Czech Republic)


Published in SPIE Proceedings Vol. 7746:
17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics
Jarmila Müllerová; Dagmar Senderáková; Stanislav Jurečka, Editor(s)

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