Share Email Print
cover

Proceedings Paper

Developer effect on the negative tone development process under low NILS conditions
Author(s): Young C. Bae; Seung-Hyun Lee; Rosemary Bell; Lori Joesten; George G. Barclay
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The effect of solvent developers on the negative tone development process was studied in both dry and immersion 193 nm lithography. While acetate-based solvent developers yielded sharp thickness contrasts with a minimum resist thickness loss, severe missing contact holes were observed under lower image-log slope conditions. In contrast, ketone-based solvent developers yielded excellent contact hole performance under poor aerial image conditions without the formation of missing contact holes. However, it was observed that ketone-based solvent developers can cause poor thickness contrasts with more resist thickness loss. By using additives in the ketone-based developers, it was possible to tailor various resist performance parameters such as photospeeds, critical dimension uniformity, resist thickness retention, and dissolution rate contrasts. It was found that higher dissolution rate contrast can give better uniformity in the critical dimension, better thickness retention and less missing contact holes.

Paper Details

Date Published: 16 April 2011
PDF: 10 pages
Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 797207 (16 April 2011); doi: 10.1117/12.882141
Show Author Affiliations
Young C. Bae, The Dow Chemical Co. (United States)
Seung-Hyun Lee, The Dow Chemical Co. (United States)
Rosemary Bell, The Dow Chemical Co. (United States)
Lori Joesten, The Dow Chemical Co. (United States)
George G. Barclay, The Dow Chemical Co. (United States)


Published in SPIE Proceedings Vol. 7972:
Advances in Resist Materials and Processing Technology XXVIII
Robert D. Allen; Mark H. Somervell, Editor(s)

© SPIE. Terms of Use
Back to Top