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Proceedings Paper

Adaptation of roll-to-roll imprint lithography: from flexible electronics to structural templates
Author(s): Edward R. Holland; Albert Jeans; Ping Mei; Carl P. Taussig; Richard E. Elder; Cynthia Bell; Emmett Howard; John Stowell
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Paper Abstract

HP has previously demonstrated the roll-to-roll (R2R) fabrication of active-matrix display backplanes using the Self-Aligned Imprint Lithography (SAIL) process. This approach permits a single imprint step to create a multi level mask comprising all patterns required for subsequent etching steps, obviating the need for multiple alignment steps. In this paper the imprint lithography technique and aspects of SAIL are reviewed. New work using imprint processing to generate structural templates, with aspect ratios approaching 6:1, for fluid containment will be presented. Arrays of transparent well structures, formed on a flexible transparent substrate provide the basis for a color display filter matrix that is filled by inkjet deposition of pigmented resins. A primary benefit of this approach is precise color pattern definition. A separation between primary color fields of 4 microns is realized without risk of color mixing or overlap. Components patterned with high absolute precision by imprint lithography were readily integrated with parts from other sources to yield flexible color reflective display demonstrator panels. This work highlights the flexibility of imprint processing and its suitability for use with a wide variety of materials and in differing applications.

Paper Details

Date Published: 4 April 2011
PDF: 11 pages
Proc. SPIE 7970, Alternative Lithographic Technologies III, 797016 (4 April 2011); doi: 10.1117/12.882085
Show Author Affiliations
Edward R. Holland, Hewlett-Packard Co. (United States)
Albert Jeans, Hewlett-Packard Co. (United States)
Ping Mei, Hewlett-Packard Co. (United States)
Carl P. Taussig, Hewlett-Packard Co. (United States)
Richard E. Elder, Hewlett-Packard Co. (United States)
Cynthia Bell, Arizona State Univ. (United States)
Emmett Howard, Arizona State Univ. (United States)
John Stowell, Arizona State Univ. (United States)

Published in SPIE Proceedings Vol. 7970:
Alternative Lithographic Technologies III
Daniel J. C. Herr, Editor(s)

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