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Proceedings Paper

A study on post-exposure delay of negative tone resist and its chemistry
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Paper Abstract

Exceptional post exposure delay (PED), CD stability, up to 72 hours was reported. This study was conducted using two negative resist formulations identical in their composition except for their PAG type. A mechanism by which the photoacid is protected from relatively moderate levels of airborne amines is proposed. Evidence of room temperature interaction between the resist components and the acid during post exposure delay was also suggested. Therefore, the PED outcome could be the result of two opposing mechanisms.

Paper Details

Date Published: 15 April 2011
PDF: 7 pages
Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79721L (15 April 2011); doi: 10.1117/12.882072
Show Author Affiliations
Medhat Toukhy, AZ Electronic Materials (United States)
Margareta Paunescu, AZ Electronic Materials (United States)
Chunwei Chen, AZ Electronic Materials (United States)

Published in SPIE Proceedings Vol. 7972:
Advances in Resist Materials and Processing Technology XXVIII
Robert D. Allen; Mark H. Somervell, Editor(s)

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