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Proceedings Paper

Quantification of the difference between two sources by Zernike polynomial decomposition
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Paper Abstract

Source Mask Optimization (SMO) technique is an advanced resolution enhancement technique with the goal of extending optical lithography lifetime by enabling low k1 imaging [1,2]. On that purpose, an appropriate source and mask duo can be optimized for a given design. SMO can yield freeform sources that can be realized to a good accuracy with optical systems such as the FlexRay [3],. However, it had been showen that even the smallest modification of the source can impact the wafer image or the process.[4] Therefore, the pupil has to be qualified, in order to measure the impact of any source deformation[5]. In this study we will introduce a new way to qualify the difference between sources, based on a Zernike polynomial decomposition [6]. Such a method can have several applications: from quantifying the scanner to scanner pupil difference, to comparing the source variation depending of the SMO settings etc. The straighforward Zernike polynomial decomposition allow us to identify some classic optical issues like coma or lens aberration.

Paper Details

Date Published: 5 April 2011
PDF: 7 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 79731Y (5 April 2011); doi: 10.1117/12.881779
Show Author Affiliations
C. Alleaume, STMicroelectronics (France)
E. Yesilada, STMicroelectronics (France)
V. Farys, STMicroelectronics (France)
Y. Trouiller, CEA-LETI (France)

Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

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