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Proceedings Paper

Structures patterning by non-contact NSOM lithography
Author(s): Ivana Kubicová; Dušan Pudiš; Lubos Šušlik; Jaroslava Škriniarová; Sofia Slabeyciusová; Ivan Martinček
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Paper Abstract

This contribution presents experimental results from the fabrication of planar photonic structures with two-dimensional (2D) arrangement. We demonstrate the near-field scanning optical microscope (NSOM) lithography as an effective optical method for fabrication of 2D photonic structures in thin photoresist layer. We employ a non-contact mode of NSOM lithography using a metal coated fiber tip in combination with 3D nanoposition piezosystem. Prepared photonic structures in thin photoresist layer deposited on the GaAs substrate are analyzed by scanning probe diagnostics. Set of experiments was realized in order to improve the aspect ratio of the patterned structures, where the exposure time and the intensity of the exposing field were parameters.

Paper Details

Date Published: 14 December 2010
PDF: 6 pages
Proc. SPIE 7746, 17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 774616 (14 December 2010); doi: 10.1117/12.881759
Show Author Affiliations
Ivana Kubicová, Univ. of Žilina (Slovakia)
Dušan Pudiš, Univ. of Žilina (Slovakia)
Lubos Šušlik, Univ. of Žilina (Slovakia)
Jaroslava Škriniarová, Slovak Univ. of Technology (Slovakia)
Sofia Slabeyciusová, Univ. of Žilina (Slovakia)
Ivan Martinček, Univ. of Žilina (Slovakia)

Published in SPIE Proceedings Vol. 7746:
17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics
Jarmila Müllerová; Dagmar Senderáková; Stanislav Jurečka, Editor(s)

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