Share Email Print
cover

Proceedings Paper

Hexafluoroalcohol (HFA) containing molecular resist materials for high-resolution lithographic applications
Author(s): Anuja De Silva; Linda K. Sundberg; Ratnam Sooriyakumaran; Luisa Bozano; Greg Breyta; William D. Hinsberg; Masaki Fujiwara
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Molecular glass resists have gained attention for the past decade as a potential platform for high resolution lithography. Several molecular resist materials based on the calix[4]resorcinarene system have been developed. Though this molecular system is very versatile, there are several challenges with the synthesis and processing of these materials. The difficulty to synthesize a monodipserse unit, the poor solubility in casting solvents and incompatibility with conventional developer are some noted challenges. We have addressed these issues by designing a new calix[4]resorcinarene resist material with hexafluro alcohol (HFA) units. The resist platform has been evaluated with e-beam and EUV lithography.

Paper Details

Date Published: 16 April 2011
PDF: 10 pages
Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79721Z (16 April 2011); doi: 10.1117/12.881735
Show Author Affiliations
Anuja De Silva, IBM Thomas J. Watson Research Ctr. (United States)
Linda K. Sundberg, IBM Almaden Research Ctr. (United States)
Ratnam Sooriyakumaran, IBM Almaden Research Ctr. (United States)
Luisa Bozano, IBM Almaden Research Ctr. (United States)
Greg Breyta, IBM Almaden Research Ctr. (United States)
William D. Hinsberg, IBM Almaden Research Ctr. (United States)
Masaki Fujiwara, Central Glass Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 7972:
Advances in Resist Materials and Processing Technology XXVIII
Robert D. Allen; Mark H. Somervell, Editor(s)

© SPIE. Terms of Use
Back to Top