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Proceedings Paper

Advanced optical methods for patterning of photonic structures in photoresist, III-V semiconductors and PMMA
Author(s): Dušan Pudiš; Luboš Šušlik; Ivana Kubicová; Jaroslava Škriniarová; Ivan Martinček
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Paper Abstract

This contribution presents experimental results in the field of planar two-dimensional (2D) photonic crystal (PhC) structures, as well as their design, fabrication and analysis. We demonstrate maskless optical methods leading to fabrication of 2D PhC structures for applications in optoelectronics. The 2D PhC structures of square and triangular symmetries with period from 275 nm to 2 μm were fabricated in thin photoresist layer, III-V semiconductor surfaces and polymethylmethacrylate using interference lithography and near-field scanning optical microscope lithography. The 2D PhC structures prepared in GaAs surface were used as a mold for nanoimprint lithography in polymethylmethacrylate.

Paper Details

Date Published: 15 December 2010
PDF: 9 pages
Proc. SPIE 7746, 17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 774608 (15 December 2010); doi: 10.1117/12.881702
Show Author Affiliations
Dušan Pudiš, Univ. of Žilina (Slovakia)
Luboš Šušlik, Univ. of Žilina (Slovakia)
Ivana Kubicová, Univ. of Žilina (Slovakia)
Jaroslava Škriniarová, Slovak Univ. of Technology (Slovakia)
Ivan Martinček, Univ. of Žilina (Slovakia)


Published in SPIE Proceedings Vol. 7746:
17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics
Jarmila Müllerová; Dagmar Senderáková; Stanislav Jurečka, Editor(s)

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