Share Email Print
cover

Proceedings Paper

Advanced scanner matching using freeform source and lens manipulators
Author(s): Jong-Ho Lim; Kyung Kang; Sung-Man Kim; Wenjin Shao; Fei Du; Zhengfan Zhang; Zongchang Yu; John Barbuto; Venu Vellanki; Yu Cao; Ronald Goossens; Seung-Hoon Park; Chris K. Park; Stefan Hunsche; Junwei Lu
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Proximity matching is a common activity in the wafer fabs1,2,3 for purposes such as process transfer, capacity expansion, improved scanner yield and fab productivity. The requirements on matching accuracy also become more and more stringent as CD error budget shrinks with the feature size as technology advances. Various studies have been carried out, using scanner knobs including NA, inner sigma, outer sigma, stage tilt, ellipticity, and dose. In this paper, we present matching results for critical features of a logic device, between an ASML XT:19x0i scanner and an XT:1700i (reference), demonstrating the advantage of freeform illuminator pupil as part of the adjustable knobs to provide additional flexibility. We also present the investigation of a novel method using lens manipulators for proximity matching, effectively injecting scalar wavefront to an XT:19x0i to mimic the behavior of the XT:1700i lens.

Paper Details

Date Published: 23 March 2011
PDF: 22 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 79732A (23 March 2011); doi: 10.1117/12.881680
Show Author Affiliations
Jong-Ho Lim, SAMSUNG Semiconductor (Korea, Republic of)
Kyung Kang, SAMSUNG Semiconductor (Korea, Republic of)
Sung-Man Kim, SAMSUNG Semiconductor (Korea, Republic of)
Wenjin Shao, Brion Technologies, Inc. (United States)
Fei Du, Brion Technologies, Inc. (United States)
Zhengfan Zhang, Brion Technologies, Inc. (United States)
Zongchang Yu, Brion Technologies, Inc. (United States)
John Barbuto, Brion Technologies, Inc. (United States)
Venu Vellanki, Brion Technologies, Inc. (United States)
Yu Cao, Brion Technologies, Inc. (United States)
Ronald Goossens, Brion Technologies, Inc. (United States)
Seung-Hoon Park, ASML Korea Co., Ltd. (Korea, Republic of)
Chris K. Park, ASML Korea Co., Ltd. (Korea, Republic of)
Stefan Hunsche, ASML Korea Co., Ltd. (Korea, Republic of)
Junwei Lu, Brion Technologies Co., Ltd. (China)


Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

© SPIE. Terms of Use
Back to Top