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Proceedings Paper

A holistic metrology approach: multi-channel scatterometry for complex applications
Author(s): Cornel Bozdog; Hyang Kyun Kim; Susan Emans; Boris Sherman; Igor Turovets; Ronen Urensky; Boaz Brill; Alok Vaid; Matthew Sendelbach
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Paper Abstract

Improvement in metrology performance when using a combination of multiple optical channels vs. standard single optical channel is studied. Two standard applications (gate etch 4x and STI etch 2x) are investigated theoretically and experimentally. The results show that while individual channels might have increased performance for few individual parameters each - it is the combination of channels that provides the best overall performance for all parameters.

Paper Details

Date Published: 20 April 2011
PDF: 8 pages
Proc. SPIE 7971, Metrology, Inspection, and Process Control for Microlithography XXV, 797113 (20 April 2011); doi: 10.1117/12.881638
Show Author Affiliations
Cornel Bozdog, Nova Measuring Instruments Inc. (United States)
Hyang Kyun Kim, Nova Measuring Instruments Inc. (United States)
Susan Emans, Nova Measuring Instruments Inc. (United States)
Boris Sherman, Nova Measuring Instruments Ltd. (Israel)
Igor Turovets, Nova Measuring Instruments Ltd. (Israel)
Ronen Urensky, Nova Measuring Instruments Ltd. (Israel)
Boaz Brill, Nova Measuring Instruments Ltd. (Israel)
Alok Vaid, GLOBALFOUNDRIES (United States)
Matthew Sendelbach, IBM Corp. (United States)


Published in SPIE Proceedings Vol. 7971:
Metrology, Inspection, and Process Control for Microlithography XXV
Christopher J. Raymond, Editor(s)

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