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Proceedings Paper

Full-chip source and mask optimization
Author(s): Min-Chun Tsai; Stephen Hsu; Luoqi Chen; Yen-Wen Lu; Jiangwei Li; Frank Chen; Hong Chen; Jun Tao; Been-Der Chen; Hanying Feng; William Wong; Wei Yuan; Xiaoyang Li; Zhipan Li; Liang Li; Russell Dover; Hua-yu Liu; Jim Koonmen
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Paper Abstract

A cost-efficient technique for full-chip source and mask optimization is proposed in this paper. This technique has two components: SMO source optimization for full-chip and flexible mask optimization (FMO). During the technology development stage of source optimization, a novel pattern-selection technique was used to identify critical clips from a full-set of design clips; SMO was then used to optimize the source based on those selected critical-clips. This pattern-selection technique enables reasonable SMO runtime to optimize the source that covers the full range of patterns. During the process development stage and product tapeout stage, FMO is employed. The FMO framework allows the use of different OPC computational techniques on different chip areas that have different sensitivities to process variations. Advanced OPC methods are applied only where they are needed, therefore achieving optimum process performance with the least tapeout and mask cost.

Paper Details

Date Published: 23 March 2011
PDF: 11 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 79730A (23 March 2011); doi: 10.1117/12.881633
Show Author Affiliations
Min-Chun Tsai, ASML Brion Technologies (United States)
Stephen Hsu, ASML Brion Technologies (United States)
Luoqi Chen, ASML Brion Technologies (United States)
Yen-Wen Lu, ASML Brion Technologies (United States)
Jiangwei Li, ASML Brion Technologies (United States)
Frank Chen, ASML Brion Technologies (United States)
Hong Chen, ASML Brion Technologies (United States)
Jun Tao, ASML Brion Technologies (United States)
Been-Der Chen, ASML Brion Technologies (United States)
Hanying Feng, ASML Brion Technologies (United States)
William Wong, ASML Brion Technologies (United States)
Wei Yuan, ASML Brion Technologies (United States)
Xiaoyang Li, ASML Brion Technologies (United States)
Zhipan Li, ASML Brion Technologies (United States)
Liang Li, ASML Brion Technologies (United States)
Russell Dover, ASML Brion Technologies (United States)
Hua-yu Liu, ASML Brion Technologies (United States)
Jim Koonmen, ASML Brion Technologies (United States)


Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

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