Share Email Print
cover

Proceedings Paper

Scanner matching for standard and freeform illumination shapes using FlexRay
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

IC manufacturers have a strong demand for transferring a working process from one scanner to another. Recently, a programmable illuminator (FlexRayTM) became available on ASML ArF immersion scanners that, besides all the parameterized source shapes of the earlier AerialTM illuminator (based on diffractive optical elements) can also produce any desired freeform source shape. As a consequence, a fabrication environment may have scanners with each of the illuminator types so both FlexRay-to-Aerial and FlexRay-to-FlexRay matching is of interest. Moreover, the FlexRay illuminator itself is interesting from a matching point-of-view, as numerous degrees of freedom are added to the matching tuning space. This paper demonstrates how the upgrade of an exposure tool from Aerial to FlexRay illuminator shows identical proximity behavior without any need for scanner tuning. Also, an assessment of the imaging correspondence between exposure tools each equipped with a FlexRay illuminator is made. Finally, for a series of use-cases where proximity differences do exist, the application of FlexRay source tuning is demonstrated. It shows an enhancement of the scanner matching capabilities, because FlexRay source tuning enables matching where traditional NA and sigma tuning are shortcoming. Moreover, it enables tuning of freeform sources where sigma tuning is not relevant. Pattern MatcherTM software of ASML Brion is demonstrated for the calculation of the optimized FlexRay tuned sources.

Paper Details

Date Published: 22 March 2011
PDF: 12 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 79731I (22 March 2011); doi: 10.1117/12.881607
Show Author Affiliations
J. Bekaert, IMEC (Belgium)
L. Van Look, IMEC (Belgium)
K. D'havé, IMEC (Belgium)
B. Laenens, IMEC (Belgium)
G. Vandenberghe, IMEC (Belgium)
P. van Adrichem, Brion Technologies (United States)
ASML (Netherlands)
W. Shao, Brion Technologies (United States)
J. Ghan, Brion Technologies (United States)
K. Schreel, ASML (Netherlands)
J. T. Neumann, Carl Zeiss SMT GmbH (Germany)


Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

© SPIE. Terms of Use
Back to Top