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Proceedings Paper

A new releasing material and continuous nano-imprinting in mold replication for patterned media
Author(s): Kouta Suzuki; Hideo Kobayashi; Takashi Sato; Hiroshi Yamashita; Tsuyoshi Watanabe
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Paper Abstract

Nano-Imprint Lithography and a mold, mold replication from an EB master mold as well, those are essential for a large-scale production of patterned media. In nano-imprinting, since it is contact printing, a higher separation force might cause damages to the master and imprinting tool, degradation in pattern quality as well. Those difficulties also work to retard continuous imprinting for the mold replication. Then, we focused on release materials characterization and selection to facilitate clean separation between cured resist and the master. This paper describes a novel release material, and continuous nano-imprinting results with it for replica mold fabrication from an EB master for the patterned media application.

Paper Details

Date Published: 4 April 2011
PDF: 6 pages
Proc. SPIE 7970, Alternative Lithographic Technologies III, 79700U (4 April 2011); doi: 10.1117/12.881581
Show Author Affiliations
Kouta Suzuki, HOYA Corp. (Japan)
Hideo Kobayashi, HOYA Corp. (Japan)
Takashi Sato, HOYA Corp. (Japan)
Hiroshi Yamashita, HOYA Corp. (Japan)
Tsuyoshi Watanabe, HOYA Corp. (Japan)


Published in SPIE Proceedings Vol. 7970:
Alternative Lithographic Technologies III
Daniel J. C. Herr, Editor(s)

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