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Proceedings Paper

Broadband spectrophotometry on nonplanar EUV multilayer optics
Author(s): I. Balasa; H. Blaschke; D. Ristau
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Paper Abstract

A reliable and compact EUV-spectrometer adapted for the broadband analysis of curved EUV-optics for near normal incidence applications will be presented. Using a specific design for the specimen holder, the limits of both types of samples, convex and concave, can be verified. The capability of the device is confirmed by investigations in the spectral reflectivity of a single EUV-multilayer mirror deposited on a silicon wafer. Its radius of curvature (ROC) is continuously adjustable, providing a direct comparison of the detected peak reflectivity, peak location and spectral bandwidth in dependence on its curvature. The range of curvature applied is in compliance with optics specifications of current projection systems for EUV-lithography.

Paper Details

Date Published: 8 April 2011
PDF: 7 pages
Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 796928 (8 April 2011); doi: 10.1117/12.881577
Show Author Affiliations
I. Balasa, Laser Zentrum Hannover e.V. (Germany)
H. Blaschke, Laser Zentrum Hannover e.V. (Germany)
D. Ristau, Laser Zentrum Hannover e.V. (Germany)


Published in SPIE Proceedings Vol. 7969:
Extreme Ultraviolet (EUV) Lithography II
Bruno M. La Fontaine; Patrick P. Naulleau, Editor(s)

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