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Proceedings Paper

Optimizing OPC data sampling based on "orthogonal vector space"
Author(s): Yuyang Sun; Yee Mei Foong; Yingfang Wang; Jacky Cheng; Dongqing Zhang; Shaowen Gao; Nanshu Chen; Byoung Il Choi; Antoine J. Bruguier; Mu Feng; Jianhong Qiu; Stefan Hunsche; Liang Liu; Wenjin Shao
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Paper Abstract

With shrinking feature sizes and error budgets in OPC models, effective pattern coverage and accurate measurement become more and more challenging. The goal of pattern selection is to maximize the efficiency of gauges used in model calibration. By optimizing sample plan for model calibration, we can reduce the metrology requirement and modeling turn-around time, without sacrificing the model accuracy and stability. With the Tachyon pattern-selection-tool, we seek to parameterize the patterns, by assessing dominant characteristics of the surroundings of the point of interest. This allows us to represent each pattern with one vector in a finite-dimensional space, and the entire patterns pool with a set of vectors. A reduced but representative set of patterns can then be automatically selected from the original full set sample data, based on certain coverage criteria. In this paper, we prove that the model built with 56% reduced wafer data could achieve comparable quality as the model built with full set data.

Paper Details

Date Published: 22 March 2011
PDF: 10 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 79732K (22 March 2011); doi: 10.1117/12.881575
Show Author Affiliations
Yuyang Sun, GLOBALFOUNDRIES (Singapore)
Yee Mei Foong, GLOBALFOUNDRIES (Singapore)
Yingfang Wang, GLOBALFOUNDRIES (Singapore)
Jacky Cheng, GLOBALFOUNDRIES (Singapore)
Dongqing Zhang, GLOBALFOUNDRIES (Singapore)
Shaowen Gao, GLOBALFOUNDRIES (Singapore)
Nanshu Chen, GLOBALFOUNDRIES (Singapore)
Byoung Il Choi, GLOBALFOUNDRIES (Singapore)
Antoine J. Bruguier, Brion Technologies, Inc. (United States)
Mu Feng, Brion Technologies, Inc. (United States)
Jianhong Qiu, Brion Technologies, Inc. (United States)
Stefan Hunsche, Brion Technologies, Inc. (United States)
Liang Liu, Brion Technologies, Inc. (United States)
Wenjin Shao, Brion Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

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